Flatness Deterioration of Silicon Epitaxial Film Formed in...

Japanese Journal of Applied Physics 2002 / 9 Vol. 41; Iss. Part 1, No

Flatness Deterioration of Silicon Epitaxial Film Formed in a Horizontal Single-Wafer Epitaxial Reactor II

Habuka, Hitoshi, Fukaya, Shinichi, Sawada, Aya, Takeuchi, Takashi, Aihara, Masahiko
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Volume:
41
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.41.5692
Date:
September, 2002
File:
PDF, 182 KB
english, 2002
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