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[ACS Symposium Series] Polymeric Materials for Microelectronic Applications Volume 579 (Science and Technology) || Novel Photosensitive Polyimide Precursor Based on Polyisoimide Using Nifedipine as a Dissolution Inhibitor

Ito, Hiroshi, Tagawa, Seiichi, Horie, Kazuyuki
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Volume:
10.1021/bk
Year:
1995
Language:
english
DOI:
10.1021/bk-1994-0579.ch019
File:
PDF, 1.29 MB
english, 1995
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