SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2013)] Metrology, Inspection, and Process Control for Microlithography XXVII - Implementation of hybrid metrology at HVM fab for 20nm and beyond
Vaid, Alok, Subramany, Lokesh, Iddawela, Givantha, Ford, Carl, Allgair, John, Agrawal, Gaurav, Taylor, John, Hartig, Carsten, Kang, Byung Cheol (Charles), Bozdog, Cornel, Sendelbach, Matthew, IsbesterVolume:
8681
Year:
2013
Language:
english
DOI:
10.1117/12.2012339
File:
PDF, 1.45 MB
english, 2013