SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Advances in Resist Materials and Processing Technology XXVII - Development of molecular resists based on Phenyl[4]calixarene derivatives.
Echigo, Masatoshi, Hayashi, Hiromi, Oizumi, Hiroaki, Matsumaro, Kazuyuki, Itani, Toshiro, Allen, Robert D.Volume:
7639
Year:
2010
Language:
english
DOI:
10.1117/12.846475
File:
PDF, 1.98 MB
english, 2010