Fumed Silica Slurry Stabilizing Methods for Chemical...

Japanese Journal of Applied Physics 2003 / 2 Vol. 42; Iss. Part 1, No

Fumed Silica Slurry Stabilizing Methods for Chemical Mechanical Polishing

Haba, Shinichi, Fukuda, Keiji, Ohta, Yoshiharu, Koubuchi, Yasushi, Katouda, Takashi
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Volume:
42
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/jjap.42.418
Date:
February, 2003
File:
PDF, 207 KB
english, 2003
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