In situ Observation of Etching Profile in...

Japanese Journal of Applied Physics 2003 / 2 Vol. 42; Iss. Part 1, No

In situ Observation of Etching Profile in Inductively Coupled Plasma Etching of GaAs and InP using Long Distance Microscope

Matsutani, Akihiro, Ohtsuki, Hideo, Koyama, Fumio
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Volume:
42
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.42.426
Date:
February, 2003
File:
PDF, 125 KB
english, 2003
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