Beam pen lithography based on arrayed polydimethylsiloxane...

Beam pen lithography based on arrayed polydimethylsiloxane (PDMS) micro-pyramids spin-coated with carbon black photo-resist

Chen, Yu-Zen, Wu, Chun-Ying, Lee, Yung-Chun
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Volume:
24
Language:
english
Journal:
Journal of Micromechanics and Microengineering
DOI:
10.1088/0960-1317/24/4/045007
Date:
April, 2014
File:
PDF, 1.48 MB
english, 2014
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