Oxygen Gas Barrier Properties of Hydrogenated Amorphous...

Oxygen Gas Barrier Properties of Hydrogenated Amorphous Carbon Thin Films Deposited with a Pulse-Biased Inductively Coupled Plasma Chemical Vapor Deposition Method

Baek, Sang-min, Shirafuji, Tatsuru, Cho, Sung-pyo, Saito, Nagahiro, Takai, Osamu
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Volume:
49
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/jjap.49.08jf10
Date:
August, 2010
File:
PDF, 563 KB
english, 2010
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