Spatial characterization of Ar–Ti plasma in a magnetron...

Plasma Sources Science and Technology 2006 / 11 Vol. 15; Iss. 4

Spatial characterization of Ar–Ti plasma in a magnetron sputtering system using emission and absorption spectroscopy

Britun, N, Gaillard, M, Schwaederlé, L, Kim, Y M, Han, J G
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Volume:
15
Language:
english
Journal:
Plasma Sources Science and Technology
DOI:
10.1088/0963-0252/15/4/024
Date:
November, 2006
File:
PDF, 421 KB
english, 2006
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