In Situ IR Spectroscopic Observation of...

Japanese Journal of Applied Physics 1990 / 10 Vol. 29; Iss. Part 1, No

In Situ IR Spectroscopic Observation of a-Si:H(F) Films Growing under Spontaneous Chemical Deposition Method

Wadayama, Toshimasa, Kayama, Hideki, Hatta, Aritada, Suëtaka, Wataru, Hanna, Jun-ichi
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Volume:
29
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.29.1884
Date:
October, 1990
File:
PDF, 846 KB
1990
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