Evaluation of planarization performance for a novel...

Evaluation of planarization performance for a novel alkaline copper slurry under a low abrasive concentration

Jiang, Mengting, Liu, Yuling, Yuan, Haobo, Chen, Guodong, Liu, Weijuan
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
35
Language:
english
Journal:
Journal of Semiconductors
DOI:
10.1088/1674-4926/35/11/116002
Date:
November, 2014
File:
PDF, 1.93 MB
english, 2014
Conversion to is in progress
Conversion to is failed