Effects of deprotonation efficiency of protected units on line edge roughness and stochastic defect generation in chemically amplified resist processes for 11 nm node of extreme ultraviolet lithography
Kozawa, Takahiro, Santillan, Julius Joseph, Itani, ToshiroVolume:
53
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.7567/JJAP.53.116504
Date:
November, 2014
File:
PDF, 395 KB
english, 2014