Effects of Substrate Temperature on Properties of Amorphous In x Ga 1- x N Films Deposited by Reactive Radio Frequency Sputtering
Suzuki, Toshimasa, Hibino, Shun, Katayama, Ruichi, Kato, Yoshinori, Ohashi, Fumitaka, Itoh, Takashi, Nonomura, ShuichiVolume:
52
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.7567/jjap.52.11ng05
Date:
November, 2013
File:
PDF, 1.64 MB
english, 2013