High voltage AlGaN/GaN metal–oxide–semiconductor high-electron mobility transistors with regrown In 0.14 Ga 0.86 N contact using a CMOS compatible gold-free process
Liu, Xinke, Bhuiyan, Maruf Amin, Somasuntharam, Pannirselvam S/O, Soh, Chew Beng, Liu, Zhihong, Chi, Dong Zhi, Liu, Wei, Lu, Youming, Yu, Wenjie, Tan, Leng Seow, Yeo, Yee-ChiaVolume:
7
Language:
english
Journal:
Applied Physics Express
DOI:
10.7567/APEX.7.126501
Date:
December, 2014
File:
PDF, 625 KB
english, 2014