Surfactant Effect on Oxide-to-Nitride Removal Selectivity...

Japanese Journal of Applied Physics 2003 / 9 Vol. 42; Iss. Part 1, No

Surfactant Effect on Oxide-to-Nitride Removal Selectivity of Nano-abrasive Ceria Slurry for Chemical Mechanical Polishing

Park, Jea-Gun, Katoh, Takeo, Lee, Won-Mo, Jeon, Hyeongtag, Paik, Ungyu
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Volume:
42
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/jjap.42.5420
Date:
September, 2003
File:
PDF, 144 KB
english, 2003
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