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Oxygen precipitation in 1020 cm−3 germanium-doped Czochralski silicon
Dong, Peng, Zhao, Jian, Liang, Xingbo, Tian, Daxi, Yuan, Shuai, Yu, Xuegong, Ma, Xiangyang, Yang, DerenVolume:
117
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.4905584
Date:
January, 2015
File:
PDF, 1.03 MB
english, 2015