Impact of CF 4 plasma treatment on threshold voltage and mobility in Al 2 O 3 /InAlN/GaN MOSHEMTs
Hu, Zongyang, Yue, Yuanzheng, Zhu, Mingda, Song, Bo, Ganguly, Satyaki, Bergman, Josh, Jena, Debdeep, Xing, Huili GraceVolume:
7
Language:
english
Journal:
Applied Physics Express
DOI:
10.7567/apex.7.031002
Date:
March, 2014
File:
PDF, 690 KB
english, 2014