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Etch-Byproduct Pore Sealing for Atomic-Layer-Deposited-TaN Deposition on Porous Low- k Film
Furuya, Akira, Soda, Eiichi, Shimada, Miyoko, Ogawa, ShinichiVolume:
44
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.44.7430
Date:
October, 2005
File:
PDF, 177 KB
english, 2005