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Effects of Postdeposition Annealing on Cobalt Nanodots Embedded in Silica for Nonvolatile Memory Application
Pei, Yanli, Kojima, Toshiya, Hiraki, Tatsuro, Fukushima, Takafumi, Tanaka, Tetsu, Koyanagi, MitsumasaVolume:
49
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.49.066503
Date:
June, 2010
File:
PDF, 673 KB
english, 2010