Analysis of the main acceptor defect in p-type GaAsN grown by chemical beam epitaxy
Elleuch, Omar, Bouzazi, Boussairi, Kowaki, Hiroyuki, Ikeda, Kazuma, Kojima, Nobuaki, Ohshita, Yoshio, Yamaguchi, MasafumiVolume:
53
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.7567/JJAP.53.091201
Date:
September, 2014
File:
PDF, 409 KB
english, 2014