Novel Shallow Trench Isolation Process from Viewpoint of...

Japanese Journal of Applied Physics 2005 / 4 Vol. 44; Iss. 4B

Novel Shallow Trench Isolation Process from Viewpoint of Total Strain Process Design for 45 nm Node Devices and Beyond

Ishibashi, Masato, Horita, Katsuyuki, Sawada, Mahito, Kitazawa, Masashi, Igarashi, Motoshige, Kuroi, Takashi, Eimori, Takahisa, Kobayashi, Kiyoteru, Inuishi, Masahide, Ohji, Yuzuru
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Volume:
44
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/jjap.44.2152
Date:
April, 2005
File:
PDF, 158 KB
english, 2005
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