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Preparation of VO 2 Films with Metal-Insulator Transition on Sapphire and Silicon Substrates by Inductively Coupled Plasma-Assisted Sputtering
Okimura, Kunio, Kubo, NaotakaVolume:
44
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.44.L1150
Date:
August, 2005
File:
PDF, 199 KB
english, 2005