Algorithms for finely adjusting etch depths to improve the diffraction efficiency uniformity of large-aperture BSG
Wu, Lixiang, Qiu, Keqiang, Liu, Ying, Fu, ShaojunVolume:
17
Language:
english
Journal:
Journal of Optics
DOI:
10.1088/2040-8978/17/3/035401
Date:
March, 2015
File:
PDF, 1.21 MB
english, 2015