Roughness characterization in the frequency domain and linewidth roughness mitigation with post-lithography processes
Vaglio Pret, AlessandroVolume:
9
Language:
english
Journal:
Journal of Micro/Nanolithography, MEMS, and MOEMS
DOI:
10.1117/1.3494614
Date:
October, 2010
File:
PDF, 680 KB
english, 2010