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SPIE Proceedings [SPIE Microlithography '90, 4-9 Mar, San Jose - San Jose, CA (Sunday 4 March 1990)] Integrated Circuit Metrology, Inspection, and Process Control IV - Accuracy of overlay measurements: tool and mark asymmetry effects
Coleman, Daniel J., Larson, Patricia J., Lopata, Alexander D., Muth, William A., Starikov, Alexander, Arnold, William H.Volume:
1261
Year:
1990
Language:
english
DOI:
10.1117/12.20042
File:
PDF, 747 KB
english, 1990