Development of High-Density Nitrogen Radical Source for Low...

Japanese Journal of Applied Physics 2013 / 02 Vol. 52; Iss. 2R

Development of High-Density Nitrogen Radical Source for Low Mosaicity and High Rate Growth of InGaN Films in Molecular Beam Epitaxy

Chen, Shang, Kawai, Yohjiro, Kondo, Hiroki, Ishikawa, Kenji, Takeda, Keigo, Kano, Hiroyuki, Sekine, Makoto, Amano, Hiroshi, Hori, Masaru
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Volume:
52
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.7567/jjap.52.021001
Date:
February, 2013
File:
PDF, 839 KB
english, 2013
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