Feasibility study of sub-10-nm-half-pitch fabrication by...

Japanese Journal of Applied Physics 2015 / 03 Vol. 54; Iss. 3

Feasibility study of sub-10-nm-half-pitch fabrication by chemically amplified resist processes of extreme ultraviolet lithography: II. Stochastic effects

Kozawa, Takahiro, Santillan, Julius Joseph, Itani, Toshiro
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Volume:
54
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.7567/JJAP.54.036507
Date:
March, 2015
File:
PDF, 679 KB
english, 2015
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