Characterization of freestanding photoresist films for...

Journal of Micromechanics and Microengineering 2013 / 02 Vol. 23; Iss. 2

Characterization of freestanding photoresist films for biological and MEMS applications

Ornoff, D M, Wang, Y, Allbritton, N L
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Volume:
23
Language:
english
Journal:
Journal of Micromechanics and Microengineering
DOI:
10.1088/0960-1317/23/2/025009
Date:
February, 2013
File:
PDF, 1.07 MB
english, 2013
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