Theoretical study on stochastic defect generation in...

Japanese Journal of Applied Physics 2014 / 06 Vol. 53; Iss. 6

Theoretical study on stochastic defect generation in chemically amplified resist process for extreme ultraviolet lithography

Kozawa, Takahiro, Santillan, Julius Joseph, Itani, Toshiro
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Volume:
53
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.7567/JJAP.53.066504
Date:
June, 2014
File:
PDF, 1.07 MB
english, 2014
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