Growth of Wide-Bandgap Nanocrystalline Silicon Carbide Films by HWCVD: Influence of Filament Temperature on Structural and Optoelectronic Properties
Jha, Himanshu S., Yadav, Asha, Singh, Mukesh, Kumar, Shailendra, Agarwal, PratimaVolume:
44
Language:
english
Journal:
Journal of Electronic Materials
DOI:
10.1007/s11664-014-3580-9
Date:
March, 2015
File:
PDF, 1.17 MB
english, 2015