Influence of reaction gas flows on the properties of SiGe:H...

Chinese Physics B 2008 / 09 Vol. 17; Iss. 9

Influence of reaction gas flows on the properties of SiGe:H thin film prepared by plasma assisted reactive thermal chemical vapour deposition

Li-Ping, Zhang, Jian-Jun, Zhang, Ze-Ren, Shang, Zeng-Xin, Hu, Xin-Hua, Geng, Ying, Zhao
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Volume:
17
Language:
english
Journal:
Chinese Physics B
DOI:
10.1088/1674-1056/17/9/051
Date:
September, 2008
File:
PDF, 1.01 MB
english, 2008
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