Stochastic effects in 11 nm imaging of extreme ultraviolet...

Japanese Journal of Applied Physics 2014 / 03 Vol. 53; Iss. 3

Stochastic effects in 11 nm imaging of extreme ultraviolet lithography with chemically amplified resists

Kozawa, Takahiro, Santillan, Julius Joseph, Itani, Toshiro
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Volume:
53
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.7567/JJAP.53.036503
Date:
March, 2014
File:
PDF, 54 KB
english, 2014
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