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Feasibility study of sub-10-nm half-pitch fabrication by chemically amplified resist processes of extreme ultraviolet lithography: I. Latent image quality predicted by probability density model
Kozawa, Takahiro, Santillan, Julius Joseph, Itani, ToshiroVolume:
53
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.7567/JJAP.53.106501
Date:
October, 2014
File:
PDF, 1.04 MB
english, 2014