Structure and optical properties of thin Al2O3films...

Semiconductors 2014 / 11 Vol. 48; Iss. 11

Structure and optical properties of thin Al2O3films deposited by the reactive ion-plasma sputtering method on GaAs (100) substrates

Seredin, P. V., Goloschapov, D. L., Lukin, A. N., Len’shin, A. S., Bondarev, A. D., Arsent’ev, I. N., Vavilova, L. S., Tarasov, I. S.
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Volume:
48
Language:
english
Journal:
Semiconductors
DOI:
10.1134/S1063782614110256
Date:
November, 2014
File:
PDF, 536 KB
english, 2014
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