Improvement of a microwave ECR plasma source for the plasma...

Plasma Sources Science and Technology 2004 / 08 Vol. 13; Iss. 3

Improvement of a microwave ECR plasma source for the plasma immersion ion implantation and deposition process

Wu, Hongchen, Zhang, Huafang, Peng, Liping, Jiang, Yanli, Ma, Guojia
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Volume:
13
Language:
english
Journal:
Plasma Sources Science and Technology
DOI:
10.1088/0963-0252/13/3/008
Date:
August, 2004
File:
PDF, 526 KB
english, 2004
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