Influence of Stacking Sequences and Lattice Parameter Differences on the Microstructure of Nonpolar AlN Films Grown on (11\bar20) 6H-SiC by Plasma-Assisted Molecular Beam Epitaxy
Vennegues, Philippe, Founta, Sebastien, Mariette, Henri, Daudin, BrunoVolume:
49
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.49.040201
Date:
April, 2010
File:
PDF, 237 KB
english, 2010