[ECS 216th ECS Meeting - Vienna, Austria (October 4 - October 9, 2009)] ECS Transactions - Physical and Electrical Characterization of Fluorine Plasma Treated Hafnium Oxide Film for High Density Metal-Insulator-Metal Capacitors
Ding, Shi-Jin, Huang, Yu-Jian, Sun, Qing-Qing, Zhang, WeiYear:
2009
Language:
english
DOI:
10.1149/1.3206621
File:
PDF, 656 KB
english, 2009