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Very Low Temperature (Cyclic) Deposition / Etch of In Situ Boron-Doped SiGe Raised Sources and Drains
Hartmann, J. M., Benevent, V., Andre, A., Sirisopanaporn, C., Veillerot, M., Samson, M. P., Barraud, S., Essa, Z., Sermage, B.Volume:
3
Language:
english
Journal:
ECS Journal of Solid State Science and Technology
DOI:
10.1149/2.0161411jss
Date:
September, 2014
File:
PDF, 2.93 MB
english, 2014