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Effect of Oxygen Post Plasma Treatment on Characteristics of Electron Cyclotron Resonance CVD Fluorine-Doped Silicon Dioxide Films Using SiF[sub 4] and O[sub 2] Gas Sources
Lee, SeoghyeongVolume:
146
Year:
1999
Language:
english
Journal:
Journal of The Electrochemical Society
DOI:
10.1149/1.1391665
File:
PDF, 548 KB
english, 1999