Deposition and Characterization of Polycrystalline Si[sub...

Journal of The Electrochemical Society 2005 Vol. 152; Iss. 1

Deposition and Characterization of Polycrystalline Si[sub 1−x]Ge[sub x] Films for CMOS Transistors Gate Electrode Applications

Lo, Wai, Lin, Hong, Hsia, Wei-Jen, Yates, Colin, Hornback, Verne, Elmer, Jim, Catabay, Wilbur, Mirabedini, Mohammad, Gopinath, Venkatesh, Li, Erhong, Pachura, David, Lin, Joyce, Duong, Lesly, Prasad,
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Volume:
152
Year:
2005
Language:
english
Journal:
Journal of The Electrochemical Society
DOI:
10.1149/1.1836125
File:
PDF, 588 KB
english, 2005
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