Plasma Nitration of HfO[sub 2] Gate Dielectric in Nitrogen Ambient for Improvement of TaN/HfO[sub 2]/Si Performance
Choi, Kyu-Jeong, Kim, Jeon-Ho, Yoon, Soon-GilVolume:
7
Year:
2004
Language:
english
Journal:
Electrochemical and Solid-State Letters
DOI:
10.1149/1.1795055
File:
PDF, 87 KB
english, 2004