Chemical mechanical polishing performances by filtering and...

Chemical mechanical polishing performances by filtering and retreatment of used silica abrasives slurry

Yong-Jin Seo, Sung-Woo Park, Nam-Hoon Kim, Eui-Goo Chang, Woo-Sun Lee
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Volume:
77
Year:
2005
Language:
english
Pages:
7
DOI:
10.1016/j.mee.2004.12.035
File:
PDF, 474 KB
english, 2005
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