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Reliability of multistacked tantalum-based structure as the barrier film in ultralarge-scale integrated metallization
Keng-Liang Ou, Chi-Chang Wu, Chiung-Chi Hsu, Chin-Sung Chen, Yih-Chuen Shyng, Wen-Fa WuVolume:
81
Year:
2005
Language:
english
Pages:
9
DOI:
10.1016/j.mee.2005.03.001
File:
PDF, 339 KB
english, 2005