![](/img/cover-not-exists.png)
Process integration of Pr-based high-k gate dielectrics
A.U. Mane, Ch. Wenger, G. Lupina, T. Schroeder, G. Lippert, R. Sorge, P. Zaumseil, G. Weidner, J. Dabrowski, H.-J. MüssigVolume:
82
Year:
2005
Language:
english
Pages:
6
DOI:
10.1016/j.mee.2005.07.004
File:
PDF, 370 KB
english, 2005