Modeling of silicon oxynitride etch microtrenching using genetic algorithm and neural network
Byungwhan Kim, Junki Bae, Byung Teak LeeVolume:
83
Year:
2006
Language:
english
Pages:
7
DOI:
10.1016/j.mee.2005.12.001
File:
PDF, 401 KB
english, 2006