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Post Plasma Etch Residue Removal Using CO[sub 2]-Based Mixtures: Mechanistic Considerations
Myneni, Satyanarayana, Hess, Dennis W.Volume:
152
Year:
2005
Language:
english
Journal:
Journal of The Electrochemical Society
DOI:
10.1149/1.2007147
File:
PDF, 617 KB
english, 2005