Predicting mask distortion, clogging and pattern transfer for stencil lithography
Maryna Lishchynska, Victor Bourenkov, Marc A.F. van den Boogaart, Lianne Doeswijk, Juergen Brugger, James C. GreerVolume:
84
Year:
2007
Language:
english
Pages:
12
DOI:
10.1016/j.mee.2006.08.003
File:
PDF, 2.01 MB
english, 2007