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UV curing effects on mechanical and electrical performances of a PECVD non-porogen porous SiOC:H films (in k [2.2–2.4] range) for 45 nm node and below
L.L. Chapelon, J. Vitiello, J.P. Gonchond, D. Barbier, J. TorresVolume:
83
Year:
2006
Language:
english
Pages:
6
DOI:
10.1016/j.mee.2006.09.022
File:
PDF, 1.20 MB
english, 2006