10 nm lines and spaces written in HSQ, using electron beam lithography
A.E. Grigorescu, M.C. van der Krogt, C.W. Hagen, P. KruitVolume:
84
Year:
2007
Language:
english
Pages:
3
DOI:
10.1016/j.mee.2007.01.022
File:
PDF, 533 KB
english, 2007