Etch modeling for model-based optical proximity correction...

Microelectronic Engineering 2007 Vol. 84; Iss. 5-8

Etch modeling for model-based optical proximity correction for 65 nm node

Christian Gardin, Jérôme Belledent, Yorick Trouiller, Amandine Borjon, Christophe Couderc, Franck Foussadier, Emek Yesilada, Jean-Christophe Urbani, Frank Sundermann, Yves Rody, Mazen Saied, Jonathan
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Volume:
84
Year:
2007
Language:
english
Pages:
4
DOI:
10.1016/j.mee.2007.01.085
File:
PDF, 163 KB
english, 2007
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